METHOD OF FABRICATING THERMAL DETECTOR DEVICE

摘要

PURPOSE: The method of fabricating a thermal detector device is provided to reduce the product cost by substituting a light detector device for a thermal detector device. CONSTITUTION: The method of fabricating the a thermal detector device is comprising the steps of; forming a first home in dielectric layer by etching method; filling an etch stopper in the first home; forming a first electrode, an infrared-absorbing layer and a semipermeability layer on the front plane of the dielectric layer; forming a second home connected in one body with the first home by etching back plane of the dielectric layer; removing the etch-stopper in the first home; forming a second electrode only on the back plane of the dielectric layer selectively; preparing a semiconductor chip having mesa-shaped isolation insulating layer; forming a metal line extending the upper plane, the side plane and the predetermined region of the isolation insulating layer; flip-chip bonding between the metal line and the second electrode by using an indium bump as mediation material.