发明名称 |
INSULATED WAVEGUIDE AND SEMICONDUCTOR PRODUCTION EQUIPMENT |
摘要 |
A method for producing an insulated waveguide while suppressing leakage of microwave without causing any trouble in the transmission of microwave and permitting various plasma sources employing a microwave waveguide to be cleaned at high speed, characterized in that at least two waveguides are coupled by a fitting structure through insulation, that the waveguide is provided with a waveguide for forming a standing microwave and a coupling part is located through insulation of at least two waveguides at a position of odd times of a quarter of the wavelength of a microwave in the waveguide from the short-circuitted termination thereof, that the waveguide is further provided with a waveguide for forming a standing microwave, the length of the waveguide being present to be equal to integer times of one half of the wavelength of a microwave in the waveguide, and a coupling part is located through insulation of at least two waveguides at a position of odd times of a quarter of the wavelength of a microwave in the waveguide from the short-circuitted termination thereof.
|
申请公布号 |
WO0005778(A1) |
申请公布日期 |
2000.02.03 |
申请号 |
WO1998JP03274 |
申请日期 |
1998.07.22 |
申请人 |
HITACHI, LTD.;UENO, YUICHIRO;TAKEMORI, SATOSHI;NAKANO, YASUNORI |
发明人 |
UENO, YUICHIRO;TAKEMORI, SATOSHI;NAKANO, YASUNORI |
分类号 |
H01P1/04;(IPC1-7):H01P1/04;H01L21/31;H01L21/205;H01L21/306 |
主分类号 |
H01P1/04 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|