发明名称 INSULATED WAVEGUIDE AND SEMICONDUCTOR PRODUCTION EQUIPMENT
摘要 <p>A method for producing an insulated waveguide while suppressing leakage of microwave without causing any trouble in the transmission of microwave and permitting various plasma sources employing a microwave waveguide to be cleaned at high speed, characterized in that at least two waveguides are coupled by a fitting structure through insulation, that the waveguide is provided with a waveguide for forming a standing microwave and a coupling part is located through insulation of at least two waveguides at a position of odd times of a quarter of the wavelength of a microwave in the waveguide from the short-circuitted termination thereof, that the waveguide is further provided with a waveguide for forming a standing microwave, the length of the waveguide being present to be equal to integer times of one half of the wavelength of a microwave in the waveguide, and a coupling part is located through insulation of at least two waveguides at a position of odd times of a quarter of the wavelength of a microwave in the waveguide from the short-circuitted termination thereof.</p>
申请公布号 WO2000005778(P1) 申请公布日期 2000.02.03
申请号 JP1998003274 申请日期 1998.07.22
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