发明名称 |
Method for selecting silicon metalloid in the direct process for making organohalosilanes |
摘要 |
<p>Silicon metalloid sample is heated above 2300 [deg]C with controlled ramp speed temperature to reduce the oxide impurities in the sample. The reduction is performed in presence of carbon source thereby effecting the formation of reduced products such as carbon dioxide and carbon monoxide. The specificity of silicon metalloid is determined by the amount of the reduced product obtained above 1900 [deg]C.</p> |
申请公布号 |
EP0976756(A2) |
申请公布日期 |
2000.02.02 |
申请号 |
EP19990305769 |
申请日期 |
1999.07.21 |
申请人 |
DOW CORNING CORPORATION |
发明人 |
KUIVILA, CHARLES SPENCER;MILLER, DAVID CLAY |
分类号 |
C07C7/14;C01B33/02;C07F7/12;G01N31/00;(IPC1-7):C07F7/16;G01N33/20 |
主分类号 |
C07C7/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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