PROCESSING LIQUID TANK WALL SURFACE STRUCTURE FOR PHOTOSENSITIVE MATERIAL PROCESSING DEVICE

摘要

PROBLEM TO BE SOLVED: To prevent the leakage of a processing liquid from the mating surfaces of side wall parts divided for the purpose of improving assembling quality with each other and to suppress the contact of the liquid with outdoor air. SOLUTION: The spacing size between adjacent auxiliary side walls 154 is expanded by a hole 160 and the capillarity in the position may be averted. Namely, the developer rises by creeping in the spacing up to the hole 160 but the rising beyond the hole is prevented by the hole 160. As a result, the rising of the developer up to the horizontal plane 154B of the auxiliary side walls 154 by the capillarity does not occur and the leakage may be prevented.