| 摘要 |
PROBLEM TO BE SOLVED: To obtain a smooth polished surface without a tool mark and a scratch even when a material such as polyethylene having ultrahigh molecules is polished and machined. SOLUTION: In a polishing tool used to polish and machine an object 5 to be polished by rotating the polishing tool 8 and the object 5 to be polished respectively in a condition in which a polishing pressure is generated between the polishing tool 8 and the object 5 to be polished and oscillating the polishing tool 8 and the object 5 to be polished relatively, an artificial or natural chamois leather is used in a polishing pad part 4 for polishing a surface to be polished of the object 5 to be polished. |
