发明名称 POLYIMIDE, ITS PRODUCTION AND PHOTOSENSITIVE COMPOSITION
摘要 PROBLEM TO BE SOLVED: To obtain a polyimide soluble in general-purpose low-boiling organic solvents represented by methyl ethyl ketone and capable of affording a negative- type polyimide soluble to aqueous alkaline solution, to provide a method for producing the above polyimide, and to obtain a photosensitive composition using it. SOLUTION: This polyimide is obtained by reaction between a diaminopolysiloxane, two kinds of diamine compound consisting of hydroxyl- contg. diamines or three kinds of diamine compound consisting of the above two kinds and an aromatic or alicyclic diamine, and 4,4'-(hexafluoroisopropylidene)diphthalic dianhydride to form a polyamic acid once which is then subjected to polyimidation reaction. The other objective photosensitive composition is obtained by incorporating the above polyimide with a photocrosslinking agent and a photo-acid generator.
申请公布号 JP2000034346(A) 申请公布日期 2000.02.02
申请号 JP19980236384 申请日期 1998.08.07
申请人 NIPPON MEKTRON LTD 发明人 KO REISHU;HAYASHI SEITEN;SENSUI NOBUYUKI
分类号 G03F7/038;C08G73/10;C08G77/455 主分类号 G03F7/038
代理机构 代理人
主权项
地址