| 摘要 |
PROBLEM TO BE SOLVED: To provide a surface treating device capable of uniformly subjecting plasma treatment to a substrate of a large area at a high speed. SOLUTION: Casing 2 is divided into two chambers of a plasma generating chamber 3 provided with plasma generating electrodes 5 and 5' and a substrate treating chamber 4 provided with a substrate supporting stand 8. On the electrode 5' composing the partition between the chambers 3 and 4, a plurality of plasma blow-off ports 6 are formed. Since this plasma blow-off ports 6 have opening width dimensions (d) at the parts satisfying 1 >= the dimensions (L) in the plasma blow-off directionthe minimum cross-sectional areas and also have nozzle shapes satisfying the area of the partition, i.e., the total Sn of the minimum cross-sectional areas of the plasma blow-off ports 6/the area Sp of the electrode 5'<=1/3, plasma is uniformly blown off from all blow-off ports 6.
|
