发明名称 Semiconductor diode
摘要 <p>A semiconductor substrate of a certain conduction type carries a metal layer with a junction which has a large total periphery. A first electrode forms an ohmic contact with the metal layer and a second electrode forms an ohmic contact with the semiconductor. The domain where the junction is formed consists of strips of 2-10 micron width. An insulating layer on the substrate has gaps 2-10 micron wide to expose the semiconductor area partly; the domain of the metal layer is arranged within the gaps.</p>
申请公布号 DE1956455(A1) 申请公布日期 1970.05.21
申请号 DE19691956455 申请日期 1969.11.10
申请人 HITACHI LTD. 发明人 ITOH,YOKICHI
分类号 H01L23/29;H01L23/485;H01L29/00 主分类号 H01L23/29
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