发明名称 POSITIVE TYPE PHOTOSENSITIVE COMPOSITION FOR INFRARED LASER
摘要 PROBLEM TO BE SOLVED: To provide a positive type photosensitive compsn. for infrared laser for a direct photomechanical process having a stable state before development and excellent in handleability by incorporating a material that absorbs light and emits heat, a resin having phenolic hydroxyl groups and soluble in an aq. alkali soln. and a specified compd. SOLUTION: The photosensitive compd. contains a material which absorbs light and emits heat, a resin having phenolic hydroxyl groups and soluble in an aq. alkali soln. and a compd. represented by the formula R1CO-X-R2, wherein X is O, S or NR3, R1 is 6-32C alkyl or alkenyl and R2 and R3 are each H, 1-18C alkyl, alkenyl or aryl. The compd. is, e.g. a fatty acid or a thio-fatty acid ester. The resin having phenolic hydroxyl groups is, e.g. a phenol- formaldehyde resin and the material that absorbs light and emits heat is, e.g. a pigment such as a black or yellow pigment.
申请公布号 JP2000035666(A) 申请公布日期 2000.02.02
申请号 JP19980229099 申请日期 1998.08.13
申请人 FUJI PHOTO FILM CO LTD 发明人 KIMURA TAKESHI
分类号 G03F7/004;G03F7/00;G03F7/039 主分类号 G03F7/004
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