发明名称 |
PRODUCTION OF SILICON CARBIDE SINGLE CRYSTAL |
摘要 |
PROBLEM TO BE SOLVED: To block micropipe defect existing in a silicon carbide single crystal by making the micropipe defect of a silicon carbide single crystal having the micropipe defect become in a state saturated with a vapor species of silicon carbide and then by repeating the procedure of the warm-up and cooling down of the silicon carbide single crystal. SOLUTION: The method of this invention is as follows: (1) preparing for heat treatment by holding a substrate crystal (silicon carbide single crystal) 1 having micropipe defect a in e.g. a crucible 3; (2) making the micropipe defect a become in a state saturated with a silicon carbide vapor species generated e.g. by the temperature rising of the silicon carbide 4 in the crucible 3; (3) heat-treating the crystal 1 by repeating the procedure of the warm-up and cooling down of the temperature of the crystal 1. It is possible to block in the micropipe defect a by efficiently recrystallizing silicon carbide in a quantity corresponding to vapor pressure difference due to the cooling down because silicon carbide sublimates in a quantity corresponding to equilibrium vapor pressure difference due to temperature difference in second warm-up and the union of dislocation progresses in second cooling down.
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申请公布号 |
JP2000034199(A) |
申请公布日期 |
2000.02.02 |
申请号 |
JP19980203696 |
申请日期 |
1998.07.17 |
申请人 |
TOYOTA CENTRAL RES & DEV LAB INC;DENSO CORP |
发明人 |
OKAMOTO ATSUHITO;SUGIYAMA NAOHIRO;TANI TOSHIHIKO;KAMIYA NOBUO;HASEGAWA TAKESHI |
分类号 |
C30B23/02;C30B25/02;C30B29/36;(IPC1-7):C30B29/36 |
主分类号 |
C30B23/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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