发明名称 SUBSTRATE TRANSFER PROCESSING APPARATUS AND METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To improve through-put, and to improve product yield by making this whole device compact by making narrow a space between substrates for non-processing. SOLUTION: An interface part 4 is provided with a wafer transfer chuck 30 for transferring a wafer for carrying in-and-out a wafer W with a carrier 1 placed on a carrying in-and-out part 2, and first and second attitude converting devices 31 and 32 having holding tools 20 for holding the plural wafers W received by the chuck 30 with prescribed intervals. The first and second attitude converting devices 31 and 32 are formed so that the attitude of the wafer W can be converted into a horizontal state and a vertical state, and that the wafer W held by one holding tool 20 can be arranged so as to be inserted between the wafers W held by the other holding tool 20 after relative movement to an attaching and detaching direction. The interface part 4 and a processing part 3 are provided with a wafer carrying chuck 18 for holding the plural wafers W held by the holding tools 20, and for carrying the plural wafers W to each processing unit 51-53 of the processing part 3.
申请公布号 JP2000036527(A) 申请公布日期 2000.02.02
申请号 JP19980202612 申请日期 1998.07.17
申请人 TOKYO ELECTRON LTD 发明人 MOKUO KATSUTOSHI
分类号 B08B11/02;B25J15/00;B25J15/08;H01L21/304;H01L21/677;H01L21/68;(IPC1-7):H01L21/68 主分类号 B08B11/02
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