发明名称 STEREO LITHOGRAPHY METHOD, PHOTO-SETTING RESIN AND STEREO LITHOGRAPHY APPARATUS
摘要 PROBLEM TO BE SOLVED: To prevent the coating irregularity and coating omission caused by repelling by providing a magnetic field applying means applying a magnetic field to a surface after coated with an uncured resin so as to apply a magnetic field to the coated surface of the uncured resin prepared by mixing a magnetic powder with a photosetting resin to erect the magnetic powder on the uncured resin coated surface to expose and cure the coated surface. SOLUTION: When an uncured resin applied by using a photosetting resin mixed with a magnetic powder 20 is scraped off, the magnetic powder 20 in the photosetting resin is attracted to the surface of the photosetting resin on the side of a magnetic field applying means 21 by the magnetic force from the magnetic field applying means 21 provided to a squeegee 3 at the time of movement of the squeegee 3 and fine unevenness is formed on the surface of the photosetting resin by the magnetic powder 20. Therefore, the cured surface also becomes the uneven surface by the magnetic powder 20. When an uncured resin is applied to the cured surface of the photosetting resin becoming unevenness by the magnetic powder 20, the coating omission 22 of the coated resin at a time when the uncured excessive resin 19 at the movement of the squeegee 3 is scraped off by the unevenness of the magnetic powder 20 can be suppressed.
申请公布号 JP2000033652(A) 申请公布日期 2000.02.02
申请号 JP19980202931 申请日期 1998.07.17
申请人 HITACHI LTD 发明人 OZAWA MASAHIKO;GOTO NORIO;ENDO TOSHIRO;MURANAKA MASAYUKI;FUKUDA MASANAO
分类号 B29C67/00;(IPC1-7):B29C67/00 主分类号 B29C67/00
代理机构 代理人
主权项
地址