| 摘要 |
<p>The present invention relates generally to a method for conditioning polishing materials that are generally used to polish disks used for magnetic recording. The polishing material is conditioned by moving a conditioning ring relative to the polishing material. More particularly, the conditioning ring is rotated and/or orbited across the surface of the polishing material, so that the material is conditioned. Preferably, the conditioning ring comprises an annular ring of abrasive material fixedly applied to a substantially planar surface of the conditioning ring.</p> |
