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发明名称
PHOTORESIST COMPOSITION
摘要
申请公布号
KR100242148(B1)
申请公布日期
2000.02.01
申请号
KR19910007121
申请日期
1991.05.02
申请人
MITSUBISHI CHEMICAL CORPORATION
发明人
NISHI, MINEO;NAKANO, KOJI;KUSMOTO, TADASHI;NAGANO, KEISKE;TANAKA, YOSHIHIRO
分类号
G03F7/023;(IPC1-7):G03F7/022
主分类号
G03F7/023
代理机构
代理人
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