发明名称 TRANSISTOR FOR HIGH VOLTAGE AND MANUFACTRUING METHOD THEREOF
摘要 The present invention discloses a high voltage field effect transistor and fabricating the same. A high voltage field effect transistor includes a semiconductor substrate, a first conductivity type well in the semiconductor substrate, first and second conductivity type drift regions in the first conductivity type well, heavily doped impurity regions having first and second conductivity types in the first conductivity type drift region, a heavily doped second conductivity type impurity region in the second conductivity type drift region, and a lightly doped second conductivity type buffer layer in the second conductivity type drift region to surround the heavily doped second conductivity type impurity region.
申请公布号 KR100244282(B1) 申请公布日期 2000.02.01
申请号 KR19970040699 申请日期 1997.08.25
申请人 HYUNDAI MICRO ELECTRONICS CO.,LTD. 发明人 KWON, OH-KYONG;LEE, MUENG-RYUL
分类号 H01L21/336;H01L29/06;H01L29/08;H01L29/10;H01L29/40;H01L29/78;(IPC1-7):H01L29/78 主分类号 H01L21/336
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