首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
SHALLOW JUNCTION FORMING METHOD OF A SEMICONDUCTOR DEVICE
摘要
申请公布号
KR100243259(B1)
申请公布日期
2000.02.01
申请号
KR19920018414
申请日期
1992.10.07
申请人
SAMSUNG ELECTRONICS CO, LTD.
发明人
PARK, SOON-OH;KIM, IL-KWON;KIM, YOUNG-WOOK
分类号
H01L21/18;(IPC1-7):H01L21/18
主分类号
H01L21/18
代理机构
代理人
主权项
地址
您可能感兴趣的专利
KYOMEIONKYOHATSUSHINSOSHINOKINSETSUBACHUNOTAISHOBUTSUOKENSASURUONKYOSOSAKENBIKYO
Control system for movable magnetic member
Gas trap apparatus
Three-dimensional chess and draughts board
Adjustable anti-drag disc brake system
RECOMBINANT IL4 ANTIBODIES USEFUL IN TREATMENT OF IL4 MEDIATED DISORDERS
Portable electronic apparatus with infrared communication function
Reducing malodour in ostomy bags
IMPROVED INTERFERON POLYMER CONJUGATES
Gradation display.
A lottery system
Method and apparatus
Illuminated plinth
Novel compounds
Flame retardent product and process
Cueing device
Improvements in and relating to wheel bearing assemblies
Monitoring the metabolic activity of cells
Lightweight aggregate
Aid to finding anagrams