发明名称 Air blow apparatus for a semiconductor wafer
摘要 An air blow apparatus peels wafers off and simultaneously removes grease and grindstone grains by blowing air into gaps formed between semiconductor wafers sliced by a wire saw from a semiconductor ingot. Two injection nozzles 1a, 1b are symmetrically mounted at predetermined positions with respect to the central line c of the semiconductor wafer 10. Air injections 11a, 11b are injected from the outer top of the semiconductor wafer 10. Injection nozzles 1a, 1b are arranged so that they are movable in the longitudinal direction of the semiconductor ingot. Air injections 11a, 11b are set to be blown out at a cone shape of about 30 degrees.
申请公布号 US6018884(A) 申请公布日期 2000.02.01
申请号 US19970884852 申请日期 1997.06.30
申请人 KOMATSU ELECTRONIC METALS CO., LTD. 发明人 FUKUNAGA, HISAYA;KUROGI, KATSUTOSHI
分类号 B08B5/02;B24B55/12;H01L21/00;H01L21/304;(IPC1-7):F26B25/00 主分类号 B08B5/02
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