| 摘要 |
<p>A gaseous compsn. at a temp. under 200 deg. C is claimed, which is suitable for coating glass at a rate pf over 350 A/s at a temp. below 200 deg. C. The compsn. contains a Sn oxide (I) precursor (IA), Si oxide (II) precursor (IIA), organic phosphite(s), organic borate(s) and/or water as accelerator (III) and an O2 source. Also claimed is a compsn. contg. (IA), (IIA), and (III) for depositing at least a first amorphous layer of (I) and (II) with controlled refractive index on glass at a rate greater than 400 A/s. The first layer consists of Sn, Si, P and opt. B oxides and pref. is amorphous. Other layer(s) may be used, pref. a second layer of (doped) Sn oxide, opt. mixed with a F cpd. The refractive index of the first layer may change continuously from the substrate to the second layer.</p> |
