| 摘要 |
PROBLEM TO BE SOLVED: To decrease the number of processes for exposure gap measurement and parallel adjustment and to perform gap control, without causing a work and a mask to come into contact with each other, even when the work becomes large in size. SOLUTION: In an adjustment stage before device use, the quantity of gap between the reverse surface of a mask M and the top surface of a work W is measured at plural places and the positions of respective work stage support parts 20, when a Z2 movement mechanism D2 is moved so that a work stage WS becomes parallel with respect to the mark M are registered as parallel origins in a control part 5 according to the quantities of the gap. At the device start up, the work stage WS is held after being moved to the parallel origins registered in the control part 5 by the Z2 moving mechanism D2 and in work exposure, the work W is mounted and held on the work stage WS; and the work stage WS is elevated by a Z2-moving mechanism D1 up to an alignment gas position, and a parallel exposure gap is provided between the mask M and the work W by the Z2-moving mechanism D2 for exposing.
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