发明名称 INTEGRATED CIRCUIT DEVICE OF INSULATED GATE TYPE FIELD EFFECT TRANSISTOR
摘要 PROBLEM TO BE SOLVED: To provide an integrated circuit device using insulated gate type field effect transistors where signal transmission delay is remarkably reduced under the actual operation of an element. SOLUTION: An integrated circuit device is constituted by integrating a plurality of insulated gate type field effect transistors. Gates 14G of the insulated gate type field effect transistors and wiring layers 14L facing the gates 14G are composed of NbCN films which turned to superconducting states under cryogenic circumstance. The gates 14G and the wiring layers 14L are practically used under cryogenic circumstance lower than or equal to a super conductivity transition temperature where states of the gates 14G and the wiring layers 14L turn to superconducting states.
申请公布号 JP2000031550(A) 申请公布日期 2000.01.28
申请号 JP19990156210 申请日期 1999.06.03
申请人 AGENCY OF IND SCIENCE & TECHNOL 发明人 AOYANAGI MASAHIRO;KUROSAWA ITARU;TAKADA SUSUMU;MATSUMOTO SATOSHI
分类号 H01L21/3205;H01L21/8234;H01L23/52;H01L27/088;H01L29/78;H01L39/22;(IPC1-7):H01L39/22;H01L21/320;H01L21/823 主分类号 H01L21/3205
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