| 摘要 |
<p>PROBLEM TO BE SOLVED: To ensure good annealing by improving a laser annealer. SOLUTION: A gas supply valve 1 for supplying nitrogen gas into a chamber 14 foe performing laser anneal and a gas supply pipe 3 conducting with a gas supply pump 2 are introduced and a diffusion filter 5 is disposed in the vicinity of an air outlet 4. Since nitrogen gas flow introduced into the chamber 14 is diffused and nitrogen density is made uniform in the chamber 14, reactive substance removing effect is made constant in the chamber 14 and an element on a substrate 19 to be processed employing a film formed by laser anneal has uniform characteristics.</p> |
