发明名称 VERTICAL TRENCH GATE TYPE MOSFET WITH HIGH CELL DENSITY
摘要 PROBLEM TO BE SOLVED: To reduce ON resistance of a power MOSFET by limiting a region for forming a body contact, and using a diode cell, thereby decreasing the width of the MOSFET. SOLUTION: In the MOSFET 70, two MOSFET cells 72 are provided for a plurality of diode cells 74. Gates of the MOSFET 70 are represented by 76A to 76D. The cells 74 are partly sandwiched between regions of a gate part 76C and a gate part 76D, and additional MOSFET cells 18 are formed so as to limit a region for similarly forming a body contact between the cells 74. Thus, the trench gate type power MOSFET having a cell density of 178 M cell/square inch can be manufactured, and an ON resistance value can be reduced.
申请公布号 JP2000031484(A) 申请公布日期 2000.01.28
申请号 JP19990149760 申请日期 1999.05.28
申请人 SILICONIX INC 发明人 WILLIAMS RICHARD K;WAYNE B GRABOWSKI
分类号 H01L21/336;H01L27/02;H01L27/07;H01L29/06;H01L29/10;H01L29/78;(IPC1-7):H01L29/78 主分类号 H01L21/336
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