| 摘要 |
PROBLEM TO BE SOLVED: To obtain a portable conformable mask system suitable for photoetching using i-lines. SOLUTION: A lower resist layer comprising a polymethyl methacrylate in which a coloring material selected from the group of N,N'-dibutyl-N,N'-di(1-(4,4'-dicyano-1,3-butadiene))-1,6-hexadiamines and 3-(2- benzothiazolyl)-7-(diethylamino)-2H-1-benzopyran-2-one have been dissolved is deposited on a semiconductor substrate and an upper resist layer contg. a resist material contg. a coloring material B having a chemical structure of the formula and a novolak resin to which acetate of a mono or dialkyl ether of ethylene glycol (solvent) and diazonaphthoquinone have been added is deposited on the lower resist layer. |
