| 摘要 |
PROBLEM TO BE SOLVED: To realize high efficiency in cleaning and in replacement of cleaning solution, by moving a partitioning plate in a cleaning bath in which wafers to be cleaned are immersed when the cleaning solution is fed to the cleaning bath. SOLUTION: A deionized-water rinse bath (cleaning bath) 1 is provided with a wafer-holding jig for holding a plurality of wafers 5, a deionized water straightening plate, and a movable partitioning plate 8 in the bath body 4, which has an opening for feeding deionized water from the bottom to feed deionized water to let it overflow. The partitioning plate 8 has a planar form, which is the same as the inner planar form of the bath body 4, and is a board having a plurality of openings 8a, through each of which each of the plurality of wafers loaded inside of the bath body 4 can be transferred, wherein the wafers are loaded within a slightly smaller cross-sectional area than the cross- sectional area of the bath body 4. The partitioning plate 8 can be moved up and down in the bath body 4, and by moving the partitioning plate in the bath body, it is possible to keep purity of the cleaning solution adequately to realize high-efficiency cleaning.
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