摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device where the variance of the sectional beam diameter of each beam on an image surface is suppressed not to cause color slippage or fading or blur of a line drawing with respect to the exposure device scanning plural beams. SOLUTION: This exposure device 1 includes a cylindrical lens 12* where a glass cylindrical lens 10* having a cylindrical surface and a lens 17* which is made of a material other than glass and has a cylindrical surface are integrated. The glass cylindrical lens and the lens made of a material other than glass are fitted to each other by clearance fitting in at least one direction of the direction orthogonal to the light advancing direction and the direction orthogonal to each of the light advancing direction and the direction orthogonal to it, and thus, they are integrated.
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