| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a substrate processing device which is capable of accurately detecting a substrate even if it is high in transmissivity, easily ensuring an installation space for a substrate detecting element, and preventing the substrate detecting element and a substrate transfer destination from interfering with each other. SOLUTION: A vertical CVD device is equipped with a wafer detector which detects whether the tweezers 511 of a wafer transfer equipment holds a wafer W or not. The wafer detecting device is equipped with an electrode member 71 and a wafer detector 72. A voltage different from that of a reference potential is applied to the electrode member 71. The wafer detector 72 detects that an electrostatic capacitance between the electrode member 71 and the reference potential changes with whether the wafer W is held by the tweezers 511 or not, whereby the wafer detector 72 is capable of detecting whether the tweezers 51 holds a wafer W or not.</p> |
