发明名称 DEVICE AND METHOD FOR DRY ETCHING
摘要 PROBLEM TO BE SOLVED: To properly pattern a liquid crystal display device constituting film, such as ITO(indium tin oxide) film, etc., formed on a glass substrate by using a resist pattern. SOLUTION: Thermal damages, such as scorching, etc., of a resist is reduced by preventing bouncing of the heat radiated from a glass substrate (substrate to be etched) 4 which carries a resist pattern, a liquid crystal device constituting film, etc., on its surface to the substrate 4 by absorbing the heat on the side of an upper electrode 2a which constitutes a dry etching device plate by coating the electrode 2a with an Ni oxide film 9b, etc., made of a material having high heat absorption.
申请公布号 JP2000031119(A) 申请公布日期 2000.01.28
申请号 JP19980193453 申请日期 1998.07.08
申请人 MITSUBISHI ELECTRIC CORP 发明人 URA TADASHI
分类号 C23F4/00;H01L21/302;H01L21/3065;(IPC1-7):H01L21/306 主分类号 C23F4/00
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