| 摘要 |
PROBLEM TO BE SOLVED: To generate uniform high density plasma, when a large substrate, such as large-scale substrate, glass substrate for liquid crystal display device, etc., is treated with plasma. SOLUTION: A plasma discharge is provided with a plurality of plasma generating sources 20, each of which generates plasma of a reactive gas and makes all plasma generating sources 20 generate plasma of the same density. Therefore, a substrate 8 to be treated can be treated with plasma by generating a uniform high density plasma over the whole surface of the substrate 8, regardless of the size of the substrate 8 by evenly arranging the plasma generating sources 20 in accordance with the size or the shape of the substrate 8. |
