发明名称 METHOD AND DEVICE FOR REPAIRING CIRCUIT PATTERN AND TRANSFER PLATE FOR THE CIRCUIT PATTERN REPAIR
摘要 PROBLEM TO BE SOLVED: To easily, speedily and accurately repair a defect (wire breaking, detect in conduction, etc.), generated on a microcircuit pattern such as an address electrode pattern of a flat panel display (plasma display panel, liquid crystal display, etc.), and an LSI circuit pattern on a silicon wafer. SOLUTION: This transfer plate 7 formed by having a conductive film adhere to one surface of a substrate, which transmits almost all of a laser beam is put on a circuit pattern having a defect to be repaired so that the conductive film faces the pattern, and the transfer plate 7 is irradiated with a laser beam B5 from behind so as to have the conductive film sputtered and transferred on the transfer plate 7 toward the defect place on the circuit pattern.
申请公布号 JP2000031013(A) 申请公布日期 2000.01.28
申请号 JP19980195538 申请日期 1998.07.10
申请人 OMRON CORP 发明人 NAKANO TATSUYA
分类号 G02F1/1343;G09F9/30;H01L21/027;(IPC1-7):H01L21/027;G02F1/134 主分类号 G02F1/1343
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