发明名称 X-RAY MASK AND ITS MANUFACTURE
摘要 <p>PROBLEM TO BE SOLVED: To provide an X-ray mask which is equipped with a circuit pattern for transfer, having high position precision and can be manufactured through a simplified manufacturing process and the manufacturing method for the mask. SOLUTION: This method for manufacturing an X-ray mask, having a base member 1 and an X-ray absorber 3 formed on the base member 1 and a mask layer 4, is formed on the X-ray absorber 3. A position detection member 31 including a position reference mark 8 is fixed to the base member 1. While the position reference mark 8 is used to detect the position of the mask layer 4, a mask pattern is drawn on the mask layer 4.</p>
申请公布号 JP2000031008(A) 申请公布日期 2000.01.28
申请号 JP19980193225 申请日期 1998.07.08
申请人 MITSUBISHI ELECTRIC CORP 发明人 AYA ATSUSHI;KICHISE KOJI;YABE HIDETAKA;KITAMURA KAEKO;MARUMOTO KENJI
分类号 G03F1/22;H01L21/027;(IPC1-7):H01L21/027;G03F1/16 主分类号 G03F1/22
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