Pattern data correction controller for one column of a multi-column electron beam exposure apparatus used for e.g. pattering a semiconductor wafer

摘要

The controller has a correction operation processing block for performing correction operation processing on exposure pattern data according to the characteristics of its corresponding column in response to a clock. The resulting correction data are supplied to a deflection/scanning unit contained in the column. A data processing block computes an operation processing time corresponding to an exposure processing cycle, required in the column, from data indicating a per-shot exposure time, settling waiting time, and exposure time correction value generated based on the correction operation processing.