发明名称 |
Multi-column lithography system using charged particle radiation-like electron rays has control unit for adjusting waiting time for each intensifier connected to main deflectors |
摘要 |
Control unit for adjusting waiting time regulates adjustable waiting time supplied by each intensifier connected to the main deflectors (30) to implement coincident irradiation within the columns. Charged particle radiation transfers multiple columns as a sample onto an exposed sample piece, while a charged particle stream is deflected in compliance with data from data store (45) for an irradiation sample and then directed over the exposed sample piece.
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申请公布号 |
DE19934049(A1) |
申请公布日期 |
2000.01.27 |
申请号 |
DE19991034049 |
申请日期 |
1999.07.16 |
申请人 |
ADVANTEST CORP., TOKIO/TOKYO |
发明人 |
SAKAZAKI, TOMOHIRO;TAKIGAWA, MASAMI |
分类号 |
G21K5/04;G03F7/20;H01J37/147;H01J37/30;H01J37/317;H01L21/027;(IPC1-7):H01J37/30;H01J37/302 |
主分类号 |
G21K5/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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