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发明名称
Verfahren zum Herstellen einer Halbleiterdünnschicht und Verfahren zur Herstellung einer Hall-Effekt-Anordnung
摘要
申请公布号
DE69422229(D1)
申请公布日期
2000.01.27
申请号
DE1994622229
申请日期
1994.05.27
申请人
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人
KAWASAKI, TETUO;KORETIKA, TETUHIRO;KITABATAKE, MAKOTO;HIRAO, TAKASHI
分类号
H01L21/20;H01L43/06;H01L43/08;(IPC1-7):H01L21/20;H01L43/14
主分类号
H01L21/20
代理机构
代理人
主权项
地址
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