发明名称 PHOTOSENSITIVE BLACK MATRIX COMPOSITION AND PROCESS OF MAKING IT
摘要 <p>A photosensitive black matrix material containing an alkali soluble polymer, a photopolymerizable polyfunctional (meth)acrylate or mixture thereof, a silica coated metal oxide pigment to block light, a trialkoxyorganosilane coupling agent, a photoinitiator, sufficient solvent to render the composition spin coatable and less than 3 wt % of a dye soluble in the solvent. The resulting composition is useful for forming black matrices for display panels such as flat panel displays. The process for forming the composition consisting of mixing the ingredients is also claimed.</p>
申请公布号 WO2000004421(A1) 申请公布日期 2000.01.27
申请号 US1999015904 申请日期 1999.07.14
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