The invention relates to a method for growing at least one silicon carbide (SiC) monocrystal (60) by sublimation of an SiC source material (30). According to said method, silicon (Si), carbon (C) and an SiC seed crystal (40) are introduced into a growing chamber (50). Thereafter the SiC source material (30) is produced from the silicon and the carbon in a synthesis step which occurs prior to the actual growing of the crystal. The SiC monocrystal (60) is grown immediately after the synthesis step. A carbon powder (20) having a mean particle diameter greater than 10 mu m is used as carbon.
申请公布号
WO0004211(A1)
申请公布日期
2000.01.27
申请号
WO1999DE01966
申请日期
1999.07.01
申请人
SIEMENS AKTIENGESELLSCHAFT;STEIN, RENE;KUHN, HARALD;VOELKL, JOHANNES