发明名称 SEMICONDUCTOR DEVICE
摘要 PURPOSE: A semiconductor device is provided to minimize a semiconductor device by using a fuse layer cut by a beam irradiation to control a redundancy circuit. CONSTITUTION: A semiconductor device comprises: a first insulated layer(2); a fuse layer(3); a pseudo fuse layer(7); a second insulated layer(4); and a protection film(6). The fuse layer is extended toward one direction on the first insulated layer and cut by a beam irradiation in order to control a redundancy circuit. The pseudo fuse layer is contacted to at least one side of the fuse layer on the first insulated layer. The second insulated layer covers the fuse layer and the pseudo fuse layer. The protection film is formed on the second insulated layer. An interval of the fuse layer is less than 4 micrometer or 4.5 to 5.5 micrometer.
申请公布号 KR20000005616(A) 申请公布日期 2000.01.25
申请号 KR19990009747 申请日期 1999.03.22
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 IWAMOTO TAKESHI;TOYOTA RUI;MOTONAMI KAORU;ITO YASHIRO;KIMURA MATATOSHI;SDAGAKU TARO;KAWABE KAZHIDE;TOI HIDEKI;SEKIKAWA HIROAKI
分类号 H01L21/82;H01L23/525;(IPC1-7):H01L21/82 主分类号 H01L21/82
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