发明名称 POLISHING FILM
摘要 PROBLEM TO BE SOLVED: To provide a polishing film for a photo connector having good sticking property to a polishing pad, being easily detachable and materualizing stable polish. SOLUTION: Thus polishing film is formed with a polishing layer 2 on the surface of a supporting body 1 and a slippage prevention layer 3 on the back of the supporting body 1, while the slippage prevention layer is composed of a minute sticking thin layer of 2 to 4μm thickness. At least the surface of the supporting body 1 formed with the slippage prevention layer 3 has an uneveness of a center line average surface roughness Ra75 within the range of 0.1 to 1.0μm formed thereon. Therefore bubble is not produced between the polishing pad and a polishing film when it is fixed, fixing and separation can be easily performed, and adhesive does not remain on it after separating it. Also highly accurate polishing can be accomplished because, at the time of polishing, the slippage prevention layer is of thickness not effecting the pressure applied to a material being polished.
申请公布号 JP2000024936(A) 申请公布日期 2000.01.25
申请号 JP19980195831 申请日期 1998.07.10
申请人 KIMOTO & CO LTD;SEIKO GIKEN:KK 发明人 YONEYAMA YUICHIRO;KODA SHUJI;SHIMIZU KOJI;SHIOKAWA NAOTOSHI;OHIGATA KAZUNORI
分类号 B24B19/00;B24D11/00;B24D11/02;(IPC1-7):B24D11/00 主分类号 B24B19/00
代理机构 代理人
主权项
地址