Thin SiO2 films, a process for producing them and their use

摘要

PCT No. PCT/EP96/04069 Sec. 371 Date Mar. 19, 1998 Sec. 102(e) Date Mar. 19, 1998 PCT Filed Sep. 17, 1996 PCT Pub. No. WO97/11035 PCT Pub. Date Mar. 27, 1997Thin SiO2 films can be produced by hydrolysis and condensation of a) 40 to 100% by weight of one or more silanes of general formula (I) Rx-Si-A4-x(I) in which the groups A are identical or different and stand for hydroxyl groups or hydrolytically separable groups, the groups R are identical or different and stand for hydrolytically non-separable groups, x has the value 0, 1, 2 or 3, x being not less than 1 for 70% by moles of said silanes; b) optionally in the presence of 0 to 50% by weight of colloidal SiO2 and/or c) 0 to 10% by weight of organic binder. The viscous sol thus obtained is worked into a gel film which is heat-treated.