| 摘要 |
PURPOSE: A method of manufacturing liquid crystal display apparatus is provided to perform high opening ratio without resin film. CONSTITUTION: According to the manufacturing method, a metal film for gate electrode(12) is formed on a glass substrate(11). A photoresist pattern is formed on the metal film and exposed portions of the metal film is oxidized, so that an anode oxidation film is formed around the gate electrode(12). A gate insulation film(14) is formed on the gate electrode(12) and anode oxidation film(13). An amorphous silicon layer is formed on the gate electrode(12) and anode oxidation film(13), and a channel layer(15) is formed. An ohmic contact layer(16) is formed at each side of the channel layer(15). Metal films for source and drain electrodes(17) are evaporates on the gate insulation film(14) where the ohmic contact layer(16) is formed. An anode oxidation film(18) is formed around the source and drain electrodes(17). A contact hole is formed on the source electrode, drain electrode(17) and anode oxidation film(18), so that the drain is exposed. A pixel electrode(20) is formed on the protection film(19) so that the pixel electrode(20) is connected to the drain electrode(17) through the contact hole.
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