PHOTOLITHOGRAPHIC PROCESS EQUIPMENT FOR FABRICATING SEMICONDUCTOR DEVICE

摘要

PURPOSE: A photo lithographic process equipment for fabricating a semiconductor device is provided with a height adjusting device of a liquid chemical blocking wall to prevent the liquid chemical from splashing. CONSTITUTION: The photo lithographic process equipment comprises a spinner for rotating a wafer having a motor, liquid chemical blocking wall formed around the spinner for preventing the liquid chemical provided to the wafer from splashing, a lifting device(7) for lifting the liquid chemical blocking wall and a height adjusting device(8) of the liquid chemical blocking wall. The photo lithographic process equipment has the advantages of preventing the wafer from scratching and the liquid chemical from splashing by adjusting the height of the liquid chemical blocking wall, thereby preventing various kinds of faults from occurring in the wafer, and of improving the productivity and the operating rate of the equipment by reducing the time required to adjust the height of the liquid chemical blocking wall.