发明名称 Conductivity improvement in thin films of refractory metal
摘要 A method of increasing conductivity of a refractory metal film disposed upon a substrate includes exposing the refractory metal film to an atmosphere comprising a silane of the form SinH(2n+2), where n is a positive integer, while subjecting the refractory metal film to a temperature in excess of 700 degrees Celsius and to a base pressure not exceeding 10-8 torr for a time period which is chosen to be sufficiently long to increase the conductivity of the refractory metal film to a correspondingly sufficient degree.
申请公布号 US6017401(A) 申请公布日期 2000.01.25
申请号 US19980170622 申请日期 1998.10.13
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 MCFEELY, FENTON READ;NOYAN, ISMAIL CEVDET;YURKAS, JOHN JACOB
分类号 C23C10/06;C23C14/58;(IPC1-7):C23C8/06 主分类号 C23C10/06
代理机构 代理人
主权项
地址