发明名称 |
Conductivity improvement in thin films of refractory metal |
摘要 |
A method of increasing conductivity of a refractory metal film disposed upon a substrate includes exposing the refractory metal film to an atmosphere comprising a silane of the form SinH(2n+2), where n is a positive integer, while subjecting the refractory metal film to a temperature in excess of 700 degrees Celsius and to a base pressure not exceeding 10-8 torr for a time period which is chosen to be sufficiently long to increase the conductivity of the refractory metal film to a correspondingly sufficient degree.
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申请公布号 |
US6017401(A) |
申请公布日期 |
2000.01.25 |
申请号 |
US19980170622 |
申请日期 |
1998.10.13 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
MCFEELY, FENTON READ;NOYAN, ISMAIL CEVDET;YURKAS, JOHN JACOB |
分类号 |
C23C10/06;C23C14/58;(IPC1-7):C23C8/06 |
主分类号 |
C23C10/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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