发明名称 |
FINE CHANNEL MEMBER, FORMATION THEREOF, LIQUID EJECTOR AND MANUFACTURE THEREOF |
摘要 |
PROBLEM TO BE SOLVED: To obtain a fine channel suitable for measuring the characteristics of gas or liquid. SOLUTION: A polysilicon film 2 is formed on a first silicon substrate 1 and implanted with impurities. A photoresist 3 is then patterned on the polysilicon film 2 and a barrier wall part 4 is formed by removing the polysilicon film 2 selectively in grid pattern. Subsequently, a silicon oxide film 5 is formed on the exposed part of the first silicon substrate 1 and the surface of the barrier part 4 thus forming a fine channel 6.
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申请公布号 |
JP2000025220(A) |
申请公布日期 |
2000.01.25 |
申请号 |
JP19980192685 |
申请日期 |
1998.07.08 |
申请人 |
RICOH CO LTD |
发明人 |
OTSUKA MASAYA;ITO KAZUNORI |
分类号 |
B41J2/045;B41J2/055;B41J2/16;(IPC1-7):B41J2/045 |
主分类号 |
B41J2/045 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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