REFERENCE VALUE SETTING METHOD OF PARTICLE MEASURING APPARATUS OF SEMICONDUCTOR DEVICES

摘要

PURPOSE: A method for setting a reference value of particle measuring apparatus is provided to easily set the reference value and prevent an error between the apparatuses by using a reference wafer having a plurality of holes. CONSTITUTION: The reference value setting method comprises the steps of preparing a reference wafer(10) formed at a plurality holes(12) having desired size by using a focus ion beam; loading the reference wafer(10) into a particle measuring apparatus and analyzing a number of holes existed on the reference wafer; and setting a reference value by input the analyzed results to the particle measuring apparatus. The size of the hole has a diameter of 0.3 micrometers.