发明名称 Method of thinning semiconductor wafer of smaller diameter than thinning equipment was designed for
摘要 A method of thinning a product wafer using equipment designed for a wafer diameter, where the diameter of the product wafer is smaller than the wafer diameter of the thinning equipment by cutting an opening in a template wafer, where the template wafer is of a diameter that may be thinned by the thinning equipment, and where the opening accommodates the product wafer; affixing the template wafer to a holding material; affixing the product wafer to the holding material and inside of the template wafer with the integrated circuit side up; depositing an etch stop onto a handle wafer, where the handle wafer is at least as large as the template wafer; bonding adhesively the product wafer to the etch stop; removing the holding material; filling any gaps between the product wafer and the template wafer; using wax to make the product wafer sufficiently planar; thinning the product wafer using the thinning equipment; removing any excess wax; bonding adhesively the product wafer to a transfer wafer, where the transfer wafer is at least as large as the template wafer; removing the handle wafer; removing the etch stop; and removing any adhesive that remains on the product wafer.
申请公布号 US6017822(A) 申请公布日期 2000.01.25
申请号 US19980154040 申请日期 1998.09.16
申请人 THE UNITED STATES OF AMERICA AS REPRESENTED BY THE NATIONAL SECURITY AGENCY 发明人 MOUNTAIN, DAVID J.
分类号 H01L21/302;H01L21/68;(IPC1-7):H01L21/302 主分类号 H01L21/302
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