发明名称 GAN SINGLE CRYSTAL BOARD AND A PROCESS THEREOF
摘要 PURPOSE: GaN single crystal board is provided to become independent with a large area and rare bending. CONSTITUTION: In the manufacturing process of GaN single crystal board consisted of forming process for mask having zigzag type or stripe type window on GaAs board, forming process for GaN buffer layer by HVPE(hydride vapor phase epitaxy) or MOC(metallorganic chloride) method in low temperature, forming process for phytexial layer on GaN bulkily by HVPE in high temperature and removing process of GaAs board.
申请公布号 KR20000006299(A) 申请公布日期 2000.01.25
申请号 KR19990023075 申请日期 1999.06.18
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 MATZMOTONAOKI;MOTOKIKENSAKU;NISHIMOTOTAZYA;OKAHISATAKUJI
分类号 C30B25/02;H01L21/20;H01L33/00;H01L33/32;(IPC1-7):C30B15/00 主分类号 C30B25/02
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