| 摘要 |
PURPOSE: The electron gun is provided to improve the uniformity of the electro-beam irradiated to the wafer by using 4-electrode electron gun. CONSTITUTION: The electron gun is comprising; a cathode for irradiating an electron beam when a high negative acceleration voltage is applied; a first greed which is presented at the lower part of the cathode for concentrating crossover images of the electro-beam, is arranged at the side of high voltage of a high-voltage insulator; an anode for collecting the electro-beam passing through the first greed which is arranged at the side of low voltage of the high-voltage insulator; and a second greed with a predetermined aperture for limiting the amount of the electro-beam, being formed between the first greed and the anode. Voltage to be a forward bias against the cathode is applied to the second greed, the crossover image is concentrated on the aperture of the second greed.
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