发明名称 INFRARED RAY ABSORPTION BOLOMETER FABRICATION METHOD OF A THREE-LAYER STRUCTURE
摘要 PURPOSE: An infrared ray absorption bolometer fabrication method is provided to have an improved absorption factor. CONSTITUTION: The infrared ray absorption bolometer fabrication method comprises the steps of: preparing a drive substrate level(210) having a substrate(212) and a pair of connection terminals(214), wherein a protection layer(216) is formed on the substrate of the drive substrate level; forming a first sacrifice layer(300) comprising a pair of void holes on the drive substrate level; forming a support level(220) by forming a pair of support posts(240) on the first sacrifice layer; forming a second sacrifice layer(310) comprising a pair of holes on the support posts and the first sacrifice layer; forming an absorption level(230) on the second sacrifice layer, wherein the absorption level comprises a bolometer surrounded by an absorption plate(290); and removing the second sacrifice layer and the first sacrifice layer.
申请公布号 KR20000004123(A) 申请公布日期 2000.01.25
申请号 KR19980025524 申请日期 1998.06.30
申请人 DAEWOO ELECTRONICS CO., LTD. 发明人 JU, SANG BAEK
分类号 H01L31/09;G01J5/02;H01L31/00;(IPC1-7):H01L31/00 主分类号 H01L31/09
代理机构 代理人
主权项
地址