| 摘要 |
PURPOSE: A phase shift mask relates to an alignment sense indicia formed on a mask. CONSTITUTION: The phase shift mask (100) includes a transparent substrate (109);, opaque material (110) which is arranged to a first surface part(114) of the transparent substrate, and is arranged to provide a first alignment sense indicia; and a second alignment sense indicia which is arranged to area having many spaces displaced to a second part of the surface of the transparent substrate. The opaque material has a cross space (116) therein. A first line (118) of the cross space provides a first alignment sense indicia for alignment sense area. A second line (120) of the cross space provides a second alignment sense indicia. Thereby, a low transparence is provided by the alignment sense indicia of the phase shift mask, and a trench size to be formed on a silicon wafer is reduced. |
