| 摘要 |
PROBLEM TO BE SOLVED: To improve the quality of film formation by facilitating the heat exchange between a gaseous starting material and a plama jet, and eliminating the thermal pinch effect of the plasma jet at the time of the heat exchange. SOLUTION: A plasma ejected from a plasma torch 1 is collided with a gaseous starting material jet 23 of the raw material of a film from the front, and heat exchange is executed to form the radical of the gaseous starting material. The flow 25 of this radical is introduced into a substrate 13 arranged in the vicinity, and the surface of the substrate 13 is stuck with the radical, by which film formation is executed. |
